New XpressKleen™ Filter Will be Featured at SEMICON West
PORT WASHINGTON, N.Y., July 12, 2016 – Pall Corporation today announced the availability of its new 5 nm XpressKleen™ filter. The filter is the latest addition to Pall’s successful XpressKleen chemical filter line-up and is a key component of Pall’s disposable PFA (Perfluoroalkoxy alkanes) KleenChange® assemblies. The new filter will be featured at SEMICON West in San Francisco.
The new 5 nm XpressKleen filter is designed to meet the growing defectivity challenges of sub-10 nm critical chemical processing. It demonstrates finer retention, fast flow, and higher purity than previous filters. Retention is validated using Pall’s gold nanoparticle challenge test.
“The 5 nm XpressKleen filter leverages Pall’s proprietary ‘XP’ cleaning process that reduces trace metal contamination by 50% to less than 500 parts per trillion (ppt) total for nineteen critical metal ions for a ten-inch device,” said Steve Chisolm, President of Pall Microelectronics. “The ‘XP’ cleaning process also removes organics, surface particles, and anions. Pall is proud to bring these important purity and retention capabilities to the market to enable the semiconductor scaling cadence.”
Pall’s completely integrated manufacturing capability extends from PTFE resin to the finished filter device. The company’s advanced manufacturing process uses clean room manufacturing and statistical process control to ensure the reliability and performance of every 5 nm XpressKleen filter.
About Pall Corporation
Pall Corporation is a filtration, separation and purification leader providing solutions to meet the critical fluid management needs of customers across the broad spectrum of life sciences and industry. Pall works with customers to advance health, safety and environmentally responsible technologies. The Company’s engineered products enable process and product innovation and minimize emissions and waste. Pall Corporation serves customers worldwide. For more information visit www.pall.com.