New Addition to Ultipleat Filter Family Delivers Unprecedented Retention
PORT WASHINGTON, NY, July 8, 2014 – Pall Corporation today launched its new 5 nm rated Ultipleat® G2 SP DR filter for aqueous wet etch and clean chemical applications. The new technology was introduced at SEMICON West in San Francisco.
This latest addition to the popular Ultipleat SP DR filter family uses Pall’s proven HAPAS membrane. The patented design tightens retention to an unprecedented 5 nm while maintaining the flow performance of its successful 10 nm predecessor. Customer tests have validated up to 30% reduction in on-wafer particles > 26 nm in size compared to the baseline 10 nm filter.
“Our customers are facing enormous challenges in sub-10 nm technology,” said Jan-Paul van Maaren, PhD, vice president of strategic marketing, Pall Microelectronics. “Our 5 nm SP DR filter offers leap-frog technology that will help them improve manufacturing yield in most of the wet etch and cleaning applications. We are proud of the strong positive feedback we have received from customers around the world.”
The new 5 nm filter is available in several different cartridge and capsule configurations, including the Ultipleat® G2 SP DR KC assemblies and the Ultipleat® SP DR SWD polyethylene capsule for point-of-use applications on single-wafer tools.
Pall Corporation (NYSE:PLL) is a filtration, separation and purification leader providing solutions to meet the critical fluid management needs of customers across the broad spectrum of life sciences and industry. Pall works with customers to advance health, safety and environmentally responsible technologies. The company’s engineered products enable process and product innovation and minimize emissions and waste. Pall Corporation is an S&P 500 company serving customers worldwide. Follow us on Twitter @PallCorporation or visit www.pall.com.