PORT WASHINGTON, N.Y., July 03, 2012 - Pall Corporation (NYSE: PLL) will unveil the latest additions to its extensive portfolio of advanced filtration and purification products designed to enable the manufacturing of 22 nanometer (nm) and finer integrated circuits at SEMICON West in San Francisco from July 10 -12 in booth #1519. The new Pall technologies can help semiconductor device producers reduce product defects and lower overall operating costs in chemical, gas, photolithography, ultrapure water and chemical mechanical polishing (CMP) applications.
At SEMICON West, Pall Corp. will feature ChamberKleenTM diffusers, which are ideally suited for vent applications on load lock interfaces or other vacuum chambers where large volumes of gas are flowing in a short amount of time. (Photo: Business Wire)
Advanced 10 and 15 nm Filtration for Wet Chemical Processing
A key addition to Pall’s chemical filter line-up for SEMICON West is the new 10 nm Ultipleat® SP DR G2 filter. Its patented, highly asymmetrical membrane removes particles down to 10 nm in size, while maintaining a very high flow rate. The larger diameter G2 filter provides 45 percent more liquid flow at the same differential pressure as the current standard filter. It reduces defects and improves productivity by increasing filtration efficiency during critical, ambient, wet chemical surface preparation processes.
Also featured is the new, all PFA disposable, UltiKleenTM G3 HiT KC assembly, containing a Pall Excellar™ ER filter cartridge with a uniquely modified, 15 nm rated PTFE membrane that remains wet in critical aqueous chemicals. The UltiKleenTM G3 HiT KC Assembly is designed with a novel construction that improves fluid dynamics and assures reliable removal efficiency under the extreme conditions of new higher temperature SPM processes. The new filter has been shown to reduce sub 20 nm particles by more than 25 percent in 120 0C sulfuric acid filtration compared to previous designs.
2 nm Filtration for Advanced Patterning Processes
Pall will introduce two products specifically designed for advanced patterning applications. The new 2 nm PE-Kleen™ filter incorporates one of the tightest membranes Pall has ever developed to target defects in the 14 nm semiconductor patterning process. This filter is constructed of ultra-high-purity, high-density polyethylene. It extends Pall Corporation’s suite of membrane materials, enabling customers to select the optimal material for their patterning chemistry.
The new Nylon Extension filter is designed to increase photoresist contact time within the nylon 6,6 membrane. The increased contact time will enhance the nylon 6,6 adsorption capability. Pall has demonstrated that the removal of insoluble polymer components by adsorption has played a critical role in reducing bridge type defects.
The new 2 nm PE-Kleen and Nylon Extension filters are available in several different cartridge and capsule configurations, including the quick-disconnect PhotoKleen™ EZD-3X assembly, which is employed on today’s most advanced lithography coater systems. These new filters are enabling significant defect reduction in advanced bottom anti-reflective coatings and photoresist chemistries.
New Gas Purification and Filtration Products
Pall will also be debuting two new products for use in ultra-high-purity gas applications. The Gaskleen® II EL purifier is a compact purifier assembly suitable for intermittent process flow rates up to 50 standard liters per minutes (slpm). The assembly can be filled with any of Pall’s AresKleen™ purification materials, which are capable of removing molecular contaminants such as moisture, oxygen, carbon dioxide and hydrocarbons to levels below 1 part per billion (ppb) from a large variety of process gases. The purifier also contains an integral filter that removes particles ? 3 nm with a > 9 log efficiency.
The company will also be releasing the new ChamberKleen™ diffusers with NW40 and NW50 flanges. The diffusers were developed for venting of load lock or other vacuum chambers where large volumes of gas need to flow in a short time. The assembly contains a high-flow filter pack capable of removing particles ? 3 nm in size. Its ability to operate at differential pressures of up to 0.72 MPa (105 psid), permits the use of higher inlet pressures to achieve faster chamber filling times.
Highly Efficient 200 nm CMP Filtration
Pall will showcase the new Profile® Nano filter developed to classify both ceria and low solids colloidal silica slurries typically used in advanced CMP processes, such as shallow trench isolation (STI) and barrier copper. The Profile Nano filter contains extremely fine fibers that improve particle removal efficiency to better than 99 percent at 200 nm. The filter improves yield and reduces the need for reworking, lowering production costs.
New Trace Metal Ion Purifier with 10 nm Particle Filter
Pall will introduce the IonKleen™ CAF purifier/ filter for critical point-of-use applications in ultrapure water. It can reduce trace metal ions to < 1 part per trillion (ppt) at challenge levels up to 10 ppb and water flow rates up to 20 liters per minute. In addition to the active polyethylene membrane, the large area, G2 style cartridge contains a highly efficient filter for removing 10 nm and greater particles.
For more information, please go to: www.pall.com/microe_54099.asp. Or visit the Pall booth (#1519) at SEMICON West 2012 in the South Hall at the Moscone Center in San Francisco from July 10 -12. You will have an opportunity to win an Apple iPad* and find out why Pall is the Gold Standard for filtration and purification.
Pall Corporation (NYSE: PLL) is a filtration, separation and purification leader providing solutions to meet the critical fluid management needs of customers across the broad spectrum of life sciences and industry. Pall works with customers to advance health, safety and environmentally responsible technologies. The company’s engineered products enable process and product innovation and minimize emissions and waste. Pall Corporation, with total revenues of $2.7 billion for fiscal year 2011, is an S&P 500 company with almost 11,000 employees serving customers worldwide. Pall has been named a “top green company” by Newsweek magazine. To see how Pall is helping enable a greener, safer, more sustainable future, follow us on Twitter @PallCorporation or visit www.pall.com/green.
*Apple and iPad are registered trademarks of Apple Inc.