PORT WASHINGTON, July 06, 2011 - Pall Corporation (NYSE:PLL), a global leader in filtration, separation and purification, will showcase its expanding line of cost -effective filtration and purification technologies for semiconductor manufacturers at SEMICON West. These products, designed for chemical, gas, photolithography and chemical mechanical polishing (CMP) applications, are the latest additions to the company’s extensive portfolio for improving the economics of integrated circuit and display manufacturing. Pall has been at the forefront of the semiconductor industry’s drive towards finer line widths by continuously providing new and innovative filtration products, systems and services to help our customers achieve ever cleaner and purer fluids.
Filters for lithography applications are available in a variety of formats, including the Ultipleat®, Falcon®, and PhotoKleenTM EZD filter formats, as shown in this photo. (Photo: Business Wire)
State-of-the-art 5 nm Lithography Filtration
Pall will launch its new 5 nm PE-Kleen™ filter for photolithography applications. The filter represents one of the tightest membranes Pall has ever developed to specifically target defects in the 22 nm semiconductor patterning process. The 5 nm PE-Kleen filter is constructed of ultra high purity, high density polyethylene. It is designed to complement Pall’s suite of membrane materials, allowing for optimal material selection, depending upon the patterning chemistry. The new 5 nm PE-Kleen filter is available in several different cartridge and capsule configurations, including the quick-disconnect PhotoKleen™ EZD-3 assembly, employed on today’s most advanced lithography coater systems. The new filter has enabled significant defect reduction in advanced bottom anti-reflective coatings and photoresist chemistries.
Advanced 15 nm Filtration Membrane for Wet Chemical Processing
A key addition to Pall’s chemical filter line-up for SEMICON West is the new 15 nm UltiKleen Excellar™ ER PTFE membrane filter cartridge. The Pall UltiKleen Excellar ER filter uses an advanced molecular surface tailoring (MST) process to remain wet in critical aqueous chemicals like SC1 and SC2. It also features an improved fluid dynamics construction, providing a robust structure that easily stands up to the extreme conditions of new higher temperature SPM processes. The new filter has been shown to reduce sub 20 nm particles by more than 25% compared to previous designs in 1200C sulfuric acid filtration.
Also at the SEMICON exhibition, Pall will feature the Ultipleat® SP DR filter with its patented, highly asymmetrical membrane that removes particles down to 10 nm in size while maintaining a very high flow rate. The Ultipleat SP DR filter reduces defects and improves productivity by increasing filtration efficiency during critical, ambient, wet chemical surface preparation processes. Both the UltiKleen Excellar ER and Ultipleat SP DR filters offer novel filtration technologies to address the contamination control challenges for 32 nm and 22 nm node devices.
New Gas Purification and Filtration Products
Pall will showcase the company’s latest Gaskleen® purifier assemblies for photolithography stepper purge gases and for hydrogen bromide (HBr) used in polysilicon plasma etching. A selection of purification materials is available to remove moisture (H2O), hydrocarbons, refractory compounds, as well as acidic and basic gases from clean dry air and nitrogen, to or below the levels specified in the 2010 International Technology Roadmap for Semiconductors (ITRS). Pall purifiers can also remove H2O, oxygen and carbon dioxide from hydrogen gas used in extreme ultraviolet (EUV) steppers to < 1 part per billion (ppb). The HBRP purifier removes H2O to < 50 ppb from HBr gas.
The company will debut its new all-stainless steel PSP Sealed-In-Line filter assembly for use in bulk gas and specialty gas distribution systems. The filter removes particles ? 3 nm with a 9 log efficiency and will be available in a variety of sizes and connections to accommodate different flow rates.
Advanced Chemical Mechanical Polishing (CMP) Filtration
Another featured Pall product is the company’s new Profile® Nano filter for advanced CMP processes, such as shallow trench isolation (STI) and barrier copper. The Pall Profile Nano filter contains extremely fine fibers that improve particle removal efficiency to better than 99 percent at 200 nm. The filter improves yield and reduces the need for reworking, lowering production costs.
For more information, go to: www.pall.com/microe_54099.asp, or visit the Pall booth at SEMICON West 2011, #1419 in the South Hall at the Moscone Center in San Francisco, July 12 - 14. You will have an opportunity to win a gold Apple iPad* 2. Find out why Pall is the Gold Standard for filtration and purification.
Pall Microelectronics supports the solar energy, semiconductor, data storage, fiber optic, display, solar, and materials markets with a comprehensive suite of contamination control solutions for chemical, gas, water, chemical mechanical polishing (CMP) and photolithography processes.
About Pall Corporation
Pall Corporation (NYSE: PLL) is a filtration, separation and purification leader providing solutions to meet the critical fluid management needs of customers across the broad spectrum of life sciences and industry. Pall works with customers to advance health, safety and environmentally responsible technologies. The Company’s engineered products enable process and product innovation and minimize emissions and waste. Pall Corporation, with total revenues of $2.4 billion for fiscal 2010, is an S&P 500 company with more than 10,000 employees serving customers worldwide. To see how Pall is helping enable a greener, safer, more sustainable future, follow us on Twitter @PallCorporation or visit www.pall.com/green.
*Apple and iPad are registered trademarks of Apple Inc.
Vivien Krygier, Ph.D.
Sr. Vice President Marketing
or Media Contact:
Director, PI Global