East Hills, NY (March 7, 2005) - - Pall Corporation introduces a new generation filter that increases flow rates nearly 50 percent over conventional filters to improve performance, productivity and yield in high-volume semiconductor etch processing. The new Ultipleat® ME Filter will help chipmakers lower their overall manufacturing costs as they increasingly move to smaller, faster chip designs.
"As chipmakers produce devices with 65nm feature sizes, their etch bath filtration requirements become increasingly complex and demanding. They need deep sub-micron filtration of particles without undue restriction on etch bath turnover rates," says Steve Chisolm, president of Pall Microelectronics. "With etch processes accounting for roughly 20 percent of all device manufacturing steps, the increased productivity that the Ultipleat ME Filters brings will enable them to move to new semiconductor chip generations without sacrificing cost-of-ownership goals."
The Ultipleat ME Filter is engineered to provide the highest flow rates for deep sub-micron filtration of hydrofluoric acid (HF) and buffered oxide etch (BOE) recirculation bath processes. It combines Pall's proprietary crescent-shaped design with its asymmetric, nanoporous membrane material, a patented technology that filters impurities down to 50nm. This complementary technology combination delivers exceptional flow rates with high removal efficiency - - a key requirement for meeting yield targets in manufacturing at the 65nm technology node. The high-flow, hydrophilic filter cartridge is compatible with both ambient temperature buffered-oxide etch bath chemistries and hydrofluoric acid mixtures.
The new filter cartridges are available in multiple sizes and grades, all of which offer greater than 99.9 percent removal efficiency.
Pall Microelectronics is the global leader in filtration, separations and purification technologies for the microelectronics industry. It supports the semiconductor, data storage, fiber optic, advance display and materials markets with a comprehensive suite of contamination control solutions for chemical, gas, water, chemical mechanical polishing and photolithography processes.
About Pall Corporation Pall Corporation is the global leader in the rapidly growing field of filtration, separations and purification. Pall's business is organized around two broad markets: Life Sciences and Industrial. The Company provides leading-edge products to meet the demanding needs of customers in biotechnology, pharmaceutical, transfusion medicine, semiconductor, water purification, aerospace and broad industrial markets. Total revenues are $1.8 billion. The Company headquarters are in East Hills, New York with extensive operations throughout the world. Visit Pall at http://www.pall.com/.