East Hills, NY (July 11, 2005) - - In a program that is redefining the microelectronics filtration market, Pall Corporation (NYSE: PLL) unveils its newest Total Fluid Management (TFM) developments for semiconductor manufacturing at SEMICON West. The Company will also introduce five new products that boost process reliability, reproducibility and productivity. The new products for lithography, gas purification and chemical applications are the latest additions to Pall's TFM portfolio to improve the economics of integrated circuit and display manufacturing.
Pall's TFM program is the first of its kind in the microelectronics filtration market. TFM brings together the Company's filtration and separations materials and scientific services capabilities to provide customers with synergistic, efficient and cost-effective fluid management systems. With TFM, Pall provides both products and services that support the industry's needs from the incoming raw materials to the outgoing waste streams and the key steps in between. By managing microelectronics filtration as a single, integrated system, customers can realize greater consistency, with higher yields, reliable product quality and less waste in their semiconductor manufacturing processes.
"Today's Pall is more than a supplier of filters. Total Fluid Management is changing the way our industry approaches filtration of critical semiconductor manufacturing processes," said Steve Chisolm, president of Pall Microelectronics. "By looking at the totality of process needs ? and drawing on our deep pool of capabilities ? we help customers reach their manufacturing goals faster than ever before."
At SEMICON West, Pall will showcase several new products that support TFM and demonstrate the breadth of its core technology strengths.
Asymmetric membrane technologies Pall introduces three new filters based on the company's proprietary asymmetric nanoporous membrane material, which gives users a patented technology to filter impurities below 50nm while maintaining exceptional flow rates. They are:
Asymmetric P-Nylon Filter ? extends Pall's 0.02-micron filtration to a broader range of lithography chemistries, including 193nm and 248nm photoresists. The new filter builds on the success of Pall's standard, 0.02-micron-rated P-Nylon filter, which is proven to significantly reduce defects in bottom anti-reflective coating (BARC) and 193 nm photoresist chemistries.
Ultipleat® CET Filter ? increases flow rates up to 30 percent over conventional filters for copper plating processes. This filter is the latest addition to Pall's growing family of Copper Electroplating Technology (CET) filters.
Ultipleat® ME Filter ? increases flow rates nearly 50 percent over conventional filters to improve performance, productivity and yield in high-volume semiconductor etch processes.
Gas purification technologies Pall introduces two new technologies from the Company's rapidly expanding family of gas purification products:
Gaskleen®-SP purifier assembly ? a novel purification technology specifically designed to protect zirconium oxide (ZrO2) sensors used in oxygen analyzers. Reduces the number of analyzer calibrations required, boosting productivity in key emerging semiconductor processes, such as low-temperature rapid thermal processing.
AresKleen? FCP point-of-use medium ? purifies fluorocarbon semiconductor process gases to sub-part per billion levels, helping to improve manufacturing yields in IC devices with features as small as 65nm.
Pall Microelectronics is the global leader in filtration, separations and purification technologies for the microelectronics industry. It supports the semiconductor, data storage, fiber optic, advance display and materials markets with a comprehensive suite of contamination control solutions for chemical, gas, water, chemical mechanical polishing and photolithography processes.
About Pall Corporation Pall Corporation (NYSE: PLL) is the global leader in the rapidly growing field of filtration, separations and purification. Pall's business is organized around two broad markets: Life Sciences and Industrial. The Company provides leading-edge products to meet the demanding needs of customers in biotechnology, pharmaceuticals, transfusion medicine, semiconductors, water purification, aerospace and broad industrial markets. Total revenues for fiscal 2004 were $1.8 billion. The Company is headquartered in East Hills, New York with extensive operations throughout the world. Further information is available at http://www.pall.com/.
Pall executives are available for interviews at the SEMICON West tradeshow, July 12- 14, at San Francisco's Moscone Center, Booth #5556, North Hall