East Hills, NY (July 21, 2005) - - Three Pall Corporation products for the microelectronics filtration market are the recipient of several industry awards for innovation, cost- of- ownership and best product. The awards were presented to Pall by three leading semiconductor industry publications at SEMICON West 2005 in San Francisco. Semiconductor International granted its Editor's Choice Best Product Award to the P-Nylon PhotoKleen? EZD-3 Filter, Gases and Technology granted its "Gassy Award" for product innovation to the High-Flow Emflon® Filter and Solid State Technology granted its Attendees' Award for Best Cost-of-Ownership to the Ultipleat® ME Filter.
"These three awards demonstrate the caliber of products we offer our customers for a broad variety of applications in the semiconductor industry," said Steve Chisolm, president of Pall Microelectronics. "We are proud to earn this recognition from our peers. This further reinforces our ongoing drive to continue to provide our customers with innovative filtration and purification solutions."
Pall received awards for the following products:
Ultipleat® ME Filter: winner of Attendees' Choice Award for "Best Cost-of-Ownership" from Solid State Technology. The Ultipleat ME filter increases flow rates nearly 50 percent over conventional filters to improve performance, productivity and yield in high-volume semiconductor etch processes. It helps chipmakers lower their overall manufacturing costs as they increasingly move to smaller, faster chip designs.
High-Flow Emflon® Filter ? winner of the Gassy Award for product innovation from Gases and Technology. The High Flow Emflon filter applies to high-flow, high-purity, bulk gas delivery systems often used in the display and semiconductor markets. The filter enables users to shrink the footprint of their filter systems, resulting in lower operational costs.
P-Nylon PhotoKleen? EZD-3 Filter? winner of the Editor's Choice Best Product Award from Semiconductor International. The P-Nylon PhotoKleen EZD-3 filter significantly reduces various photolithography defects while providing faster system start up and minimizing operator exposure to volatile lithography chemicals. It is ideal for all lithography applications and can be specified on the latest generation lithography equipment or can be retrofitted into existing systems.
Pall Microelectronics is the global leader in filtration, separations and purification technologies for the microelectronics industry. It supports the semiconductor, data storage, fiber optic, advance display and materials markets with a comprehensive suite of contamination control solutions for chemical, gas, water, chemical mechanical polishing and photolithography processes.
About Pall Corporation Pall Corporation (NYSE: PLL) is the global leader in the rapidly growing field of filtration, separations and purification. Pall's business is organized around two broad markets: Life Sciences and Industrial. The Company provides leading-edge products to meet the demanding needs of customers in biotechnology, pharmaceuticals, transfusion medicine, semiconductors, water purification, aerospace and broad industrial markets. Total revenues for fiscal 2004 were $1.8 billion. The Company is headquartered in East Hills, New York with extensive operations throughout the world. Further information is available at www.pall.com.
Media Contact Marcia Katz Director of Public Relations Telephone: 516-801-9851 Fax: 516-484-3649 Email: email@example.com